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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning
Chakrabarty, Souvik, Naulleau, Patrick P., Ouyang, Christine, Krysak, Marie, Trikeriotis, Markos, Cho, Kyoungyoung, Giannelis, Emmanuel P., Ober, Christopher K.Volume:
8679
Year:
2013
Language:
english
DOI:
10.1117/12.2011490
File:
PDF, 855 KB
english, 2013