The Enhanced Diffusion of Low-Concentration Phosphorus, Arsenic and Boron in Silicon during IR-Heating
Ishikawa, Yutaka, Yamauchi, Kazuyuki, Nakamichi, IchiroVolume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.28.l1319
Date:
August, 1989
File:
PDF, 457 KB
1989