Growth of Atomically Flat-Surface Aluminum Nitride...

Japanese Journal of Applied Physics 2005 / 5 Vol. 44; Iss. 5A

Growth of Atomically Flat-Surface Aluminum Nitride Epitaxial Film by Metalorganic Chemical Vapor Deposition

Uehara, Kensei, Aota, Yuji, Kameda, Suguru, Nakase, Hiroyuki, Isota, Yoji, Tsubouchi, Kazuo
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.2987
Date:
May, 2005
File:
PDF, 191 KB
english, 2005
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