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ALD and Characterization of Aluminum Oxide Deposited on Si(100) using Tris(diethylamino) Aluminum and Water Vapor
Katamreddy, Rajesh, Inman, Ronald, Jursich, Gregory, Soulet, Axel, Takoudis, ChristosVolume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2239258
File:
PDF, 558 KB
english, 2006