In Situ Measurement of Internal Stress in Electrolessly...

Electrochemical and Solid-State Letters 2007 Vol. 10; Iss. 6

In Situ Measurement of Internal Stress in Electrolessly Deposited Copper Film by Television Holographic Interferometry

Fukumuro, Naoki, Yamazaki, Motohiro, Ito, Kiyoshi, Ishihara, Hajime, Kakunai, Satoshi, Yae, Shinji, Matsuda, Hitoshi
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Volume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2719552
File:
PDF, 209 KB
english, 2007
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