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The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2 Formulations
Li, B., Han, T., Wang, L., Wang, Q., Li, Y.Volume:
2
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.005304jss
Date:
January, 2013
File:
PDF, 433 KB
english, 2013