Electrical Stability and Reliability of Ultralow Dielectric Constant Porous Carbon-Doped Oxide film for Copper Interconnect
Fang, Kuo-Lung, Tsui, Bing-YueVolume:
152
Year:
2005
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2007168
File:
PDF, 233 KB
english, 2005