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Deposition of New Binary Oxide Thin Films by the Pyrolytic Decomposition of Trimethylsiloxy-Aluminum-lsopropoxide (Me[sub 3]SiO)[sub n]Al(O[sup i]Pr)[sub 3−n]
Nakaido, Yasuaki, Toyoshima, SatoshiVolume:
115
Year:
1968
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2410898
File:
PDF, 205 KB
english, 1968