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Resistive Switching Characteristics of a SiOx Layer with CF4 Plasma Treatment
Liu, Chih-Yi, Tsai, Yueh-Ying, Fang, Wen-Tsung, Wang, Hung-YuVolume:
2014
Year:
2014
Language:
english
Journal:
Journal of Nanomaterials
DOI:
10.1155/2014/703463
File:
PDF, 460 KB
english, 2014