Plasma Enhanced Chemical Vapor Deposition of Manganese on...

ECS Solid State Letters 2012 / 12 Vol. 2; Iss. 3

Plasma Enhanced Chemical Vapor Deposition of Manganese on Low-k Dielectrics for Copper Diffusion Barrier Application

Jourdan, N., Barbarin, Y., Croes, K., Kong Siew, Y., Van Elshocht, S., Tokei, Z., Vancoille, E.
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Volume:
2
Language:
english
Journal:
ECS Solid State Letters
DOI:
10.1149/2.002303ssl
Date:
December, 2012
File:
PDF, 350 KB
english, 2012
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