![](/img/cover-not-exists.png)
Study of hafnium oxide thin films deposited by RF magnetron sputtering under glancing angle deposition at varying target to substrate distance
Haque, S. Maidul, Rao, K. Divakar, Misal, J.S., Tokas, R.B., Shinde, D.D., Ramana, J.V., Rai, Sanjay, Sahoo, N.K.Volume:
353
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.06.077
Date:
October, 2015
File:
PDF, 2.36 MB
english, 2015