Study of hafnium oxide thin films deposited by RF magnetron...

Applied Surface Science 2015 / 10 Vol. 353

Study of hafnium oxide thin films deposited by RF magnetron sputtering under glancing angle deposition at varying target to substrate distance

Haque, S. Maidul, Rao, K. Divakar, Misal, J.S., Tokas, R.B., Shinde, D.D., Ramana, J.V., Rai, Sanjay, Sahoo, N.K.
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Volume:
353
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.06.077
Date:
October, 2015
File:
PDF, 2.36 MB
english, 2015
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