Integrating atomic layer deposition and ultra-high vacuum...

Review of Scientific Instruments 2014 / 07 Vol. 85; Iss. 7

Integrating atomic layer deposition and ultra-high vacuum physical vapor deposition for in situ fabrication of tunnel junctions

Elliot, Alan J., Malek, Gary A., Lu, Rongtao, Han, Siyuan, Yu, Haifeng, Zhao, Shiping, Wu, Judy Z.
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Volume:
85
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.4890286
Date:
July, 2014
File:
PDF, 1.44 MB
english, 2014
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