Protection of extreme ultraviolet lithography masks. I....

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2015 / 05 Vol. 33; Iss. 3

Protection of extreme ultraviolet lithography masks. I. Thermophoretic protection factors at low pressure for diffusing nanoscale particles

Klebanoff, Leonard E., Geller, Anthony S., Torczynski, John R., Gallis, Michael A., Rader, Daniel J., Chilese, Frank C., Garcia, Rudy F., Delgado, Gil
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4916210
Date:
May, 2015
File:
PDF, 1.97 MB
english, 2015
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