SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Liu, Chi-Chun, Pitera, Jed, Lafferty, Neal, Lai, Kafai, Rettner, Charles, Tjio, Melia, Arellano, Noel, Cheng, Joy, Tong, William M.
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Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916525
File:
PDF, 1.50 MB
english, 2012
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