Reliability of ALD Hf1-XZrxO2 Deposited by Intermediate...

ECS Transactions 2013 / 08 Vol. 58; Iss. 7

Reliability of ALD Hf1-XZrxO2 Deposited by Intermediate Annealing or Intermediate Plasma Treatment

Bhuyian, M., Misra, D., Tapily, K., Clark, R., Consiglio, S., Wajda, C., Nakamura, G., Leusink, G.
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Volume:
58
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/05807.0017ecst
Date:
August, 2013
File:
PDF, 741 KB
english, 2013
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