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Reduced Metal Contamination in Atomic-Layer-Deposited HfO[sub 2] Films Grown on Si Using O[sub 3] Oxidant Generated Without N[sub 2] Assistance
Park, Tae Joo, Chung, Keum Jee, Kim, Hyun-Chul, Ahn, Jinho, Wallace, Robert M., Kim, JiyoungVolume:
13
Year:
2010
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3430657
File:
PDF, 532 KB
english, 2010