High-Efficient Damage-Free Correction of the Thickness...

Key Engineering Materials 2009 / 2 Vol. 407-408

High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM

Yamamura, Kazuya, Morikawa, Tetsuya, Ueda, Masaki
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Volume:
407-408
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.407-408.343
Date:
February, 2009
File:
PDF, 904 KB
english, 2009
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