Benzophenone doped polydimethylsiloxane: self developable composite resist system for its use in a direct write laser lithography application
Bute, Madhushree G, Shinde, Shashikant D, Bodas, Dhananjay, Fouad, H, Adhi, K P, Gosavi, S WVolume:
48
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/48/17/175301
Date:
May, 2015
File:
PDF, 2.46 MB
english, 2015