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Residual stress relaxation mechanism at low homologous temperature in nanocrystalline iron thin film deposited on Si (1 0 0) substrate
Chakravarty, Sujay, Chirayath, Varghese Anto, Gangavarapu, Amarendra, Parida, Pradyumna, Dasgupta, ArupVolume:
48
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/48/30/305303
Date:
August, 2015
File:
PDF, 1.13 MB
english, 2015