Achieving Extreme Etching Rates by Overcoming Silicon Passivity
Zaid, T., Starosvetsky, D., Irace, A., De Laurentis, M., Ein-Eli, Y.Volume:
13
Year:
2010
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3358141
File:
PDF, 436 KB
english, 2010