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Deposition of a-SiC:H thin film from organosilicon material by remote plasma CVD method
Y.-Y Xu, T Muramatsu, M Taniyama, T Aoki, Y HatanakaVolume:
368
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(00)00761-6
File:
PDF, 253 KB
english, 2000