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Self-aligned selective-epitaxial-growth SiGe HBTs: process, device, and ICs
Katsuyoshi Washio, Eiji Ohue, Katsuya Oda, Reiko Hayami, Masamichi Tanabe, Hiromi Shimamoto, Toru Masuda, Ken'ichi Ohhata, Masao KondoVolume:
369
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(00)00868-3
File:
PDF, 542 KB
english, 2000