Si1−xGex selective epitaxial growth for ultra-high-speed...

Thin Solid Films 2000 Vol. 369; Iss. 1-2

Si1−xGex selective epitaxial growth for ultra-high-speed self-aligned HBTs

Katsuya Oda, Eiji Ohue, Masamichi Tanabe, Hiromi Shimamoto, Katsuyoshi Washio
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Volume:
369
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(00)00869-5
File:
PDF, 239 KB
english, 2000
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