PECVD of amorphous TiO2 thin films: effect of growth...

Thin Solid Films 2000 Vol. 371; Iss. 1-2

PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition

G.A. Battiston, R. Gerbasi, A. Gregori, M. Porchia, S. Cattarin, G.A. Rizzi
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Volume:
371
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(00)00998-6
File:
PDF, 268 KB
english, 2000
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