Applicability of ALE TiN films as Cu/Si diffusion barriers

Thin Solid Films 2000 Vol. 372; Iss. 1-2

Applicability of ALE TiN films as Cu/Si diffusion barriers

Dong-Jin Kim, Young-Bae Jung, Myoung-Bok Lee, Yong-Hyun Lee, Jong-Hyun Lee, Jung-Hee Lee
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Volume:
372
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(00)01049-x
File:
PDF, 710 KB
english, 2000
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