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Chemical stability of Ta diffusion barrier between Cu and Si
T Laurila, K Zeng, J.K Kivilahti, J Molarius, I SuniVolume:
373
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(00)01102-0
File:
PDF, 367 KB
english, 2000