a-Si:H film deposition using same phase modulated scanning...

a-Si:H film deposition using same phase modulated scanning plasma method

Yoko Maemura, Toru Yamaguchi, Sung-Chae Yang, Hiroshi Fujiyama
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Volume:
374
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(00)01164-0
File:
PDF, 191 KB
english, 2000
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