Evaluation of precursors for chemical vapor deposition of...

Thin Solid Films 2000 Vol. 376; Iss. 1-2

Evaluation of precursors for chemical vapor deposition of ruthenium

K.C Smith, Y.-M Sun, N.R Mettlach, R.L Hance, J.M White
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
376
Year:
2000
Language:
english
Pages:
9
DOI:
10.1016/s0040-6090(00)01356-0
File:
PDF, 361 KB
english, 2000
Conversion to is in progress
Conversion to is failed