Electronic and topographic properties of amorphous and microcrystalline silicon thin films
J.P. Kleider, C. Longeaud, R. Brüggemann, F. HouzéVolume:
383
Year:
2001
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(00)01614-x
File:
PDF, 1.65 MB
english, 2001