Inductively coupled plasma application to the resist ashing

Inductively coupled plasma application to the resist ashing

Ken-ichi Takagi, Akihiro Ikeda, Tsuyoshi Fujimura, Yukinori Kuroki
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Volume:
386
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(00)01636-9
File:
PDF, 290 KB
english, 2001
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