Effect of Sample Elevation in Radio Frequency Plasma...

Materials 2014 / 02 Vol. 7; Iss. 2

Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

Śmietana, Mateusz, Mroczyński, Robert, Kwietniewski, Norbert
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Volume:
7
Language:
english
Journal:
Materials
DOI:
10.3390/ma7021249
Date:
February, 2014
File:
PDF, 739 KB
english, 2014
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