Production of fluorinated fullerene film by a CF4 RF plasma

Production of fluorinated fullerene film by a CF4 RF plasma

Sung-Chae Yang, Tetsu Mieno
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Volume:
386
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(00)01675-8
File:
PDF, 152 KB
english, 2001
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