Effect of sputtering-gas pressure on properties of silicon...

Thin Solid Films 2001 Vol. 384; Iss. 1

Effect of sputtering-gas pressure on properties of silicon nitride films produced by helicon plasma sputtering

Wei-Tang Li, David R. McKenzie, William D. McFall, Qi-Chu Zhang
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Volume:
384
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(00)01695-3
File:
PDF, 137 KB
english, 2001
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