Chemical–mechanical polishing of SiOC organosilicate...

Thin Solid Films 2001 Vol. 385; Iss. 1-2

Chemical–mechanical polishing of SiOC organosilicate glasses: the effect of film carbon content

Christopher L. Borst, Vincent Korthuis, Gregory B. Shinn, J.D. Luttmer, Ronald J. Gutmann, William N. Gill
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Volume:
385
Year:
2001
Language:
english
Pages:
12
DOI:
10.1016/s0040-6090(00)01925-8
File:
PDF, 961 KB
english, 2001
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