Three-dimensional wafer scale hydrodynamic modeling for...

Thin Solid Films 2001 Vol. 389; Iss. 1-2

Three-dimensional wafer scale hydrodynamic modeling for chemical mechanical polishing

Chul-Ho Cho, Sang-Shin Park, Yoomin Ahn
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Volume:
389
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(01)00883-5
File:
PDF, 255 KB
english, 2001
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