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Study of GaAs and GaInP etching in Cl2/Ar electron cyclotron resonance plasma
S.F. Yoon, T.K. Ng, H.Q. ZhengVolume:
394
Year:
2001
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(01)01139-7
File:
PDF, 582 KB
english, 2001