Thermal stability of amorphous thin films: Ti3Si1O8 vs....

Thermal stability of amorphous thin films: Ti3Si1O8 vs. TiO2 and mictamict compounds

P.H Giauque, H.B Cherry, M.-A Nicolet
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Volume:
394
Year:
2001
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(01)01154-3
File:
PDF, 635 KB
english, 2001
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