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A comparative study of sputtered TaCx and WCx films as diffusion barriers between Cu and Si
Shui Jinn Wang, Hao Yi Tsai, S.C SunVolume:
394
Year:
2001
Language:
english
Pages:
9
DOI:
10.1016/s0040-6090(01)01173-7
File:
PDF, 1.09 MB
english, 2001