On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
M.I Alayo, I Pereyra, W.L Scopel, M.C.A FantiniVolume:
402
Year:
2002
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(01)01685-6
File:
PDF, 154 KB
english, 2002