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Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition
Dah-Shyang Tsai, Tzu-Chien Chang, Wei-Cheng Hsin, H Hamamura, Y ShimogakiVolume:
411
Year:
2002
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(02)00237-7
File:
PDF, 491 KB
english, 2002