Interface properties of ultra-thin HfO2 films grown by...

Thin Solid Films 2003 Vol. 428; Iss. 1-2

Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si

O. Renault, D. Samour, D. Rouchon, Ph. Holliger, A.-M. Papon, D. Blin, S. Marthon
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
428
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(02)01198-7
File:
PDF, 277 KB
english, 2003
Conversion to is in progress
Conversion to is failed