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Effect of deposition conditions and dielectric plasma treatments on the electrical properties of microcrystalline silicon TFTs
S. Kasouit, P. Roca i Cabarrocas, R. Vanderhaghen, Y. Bonassieux, M. Elyaakoubi, I. French, J. Rocha, B. VitouxVolume:
427
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(02)01247-6
File:
PDF, 193 KB
english, 2003