Deposition chemistry in the Cat-CVD processes of the...

Thin Solid Films 2003 Vol. 430; Iss. 1-2

Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system

Hironobu Umemoto, Takashi Morimoto, Moroyuki Yamawaki, Yoshie Masuda, Atsushi Masuda, Hideki Matsumura
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Volume:
430
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(03)00124-x
File:
PDF, 98 KB
english, 2003
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