Deep Dry Etching of Quartz Plate Over 100 µm in Depth...

Japanese Journal of Applied Physics 2003 / 6 Vol. 42; Iss. Part 1, No

Deep Dry Etching of Quartz Plate Over 100 µm in Depth Employing Ultra-Thick Photoresist (SU-8)

Fukasawa, Takayuki, Horiike, Yasuhiro
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.3702
Date:
June, 2003
File:
PDF, 493 KB
english, 2003
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