ECS Transactions [ECS 218th ECS Meeting - Las Vegas, NV (October 10 - October 15, 2010)] - The TDDB Study of Post-CMP Cleaning Effect for L40 Direct Polished Porous Low K Dielectrics Cu Interconnect
Hsu, Chia-Lin, Lin, Welch, Hsu, Chun-Wei, Lin, Jen-Chieh, Tsai, Teng-Chun, Huang, Chien-Chung, Wu, J. Y., Perng, Dung-ChingYear:
2010
Language:
english
DOI:
10.1149/1.3489050
File:
PDF, 205 KB
english, 2010