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Evaluation of HfO2 film structures deposited by metal-organic chemical vapor deposition using Hf(N(C2H5)2)4/O2 gas system
Atsushi Ogura, Kimihiko Ito, Yoshio Ohshita, Masato Ishikawa, Hideaki MachidaVolume:
441
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(03)00672-2
File:
PDF, 544 KB
english, 2003