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Electrophysical properties of thin germanium/carbon layers produced on silicon using organometallic radio frequency plasma enhanced chemical vapor deposition process
J. Szmidt, M. Gazicki-Lipman, H. Szymanowski, R. Mazurczyk, A. Werbowy, A. KudłaVolume:
441
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(03)00884-8
File:
PDF, 376 KB
english, 2003