Silicon thin films deposited at very low substrate...

Thin Solid Films 2003 Vol. 442; Iss. 1-2

Silicon thin films deposited at very low substrate temperatures

M. Ito, K. Ro, S. Yoneyama, Y. Ito, H. Uyama, T. Mates, M. Ledinsky, K. Luterova, P. Fojtik, H. Stuchlikova, A. Fejfar, J. Kocka
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Volume:
442
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(03)00965-9
File:
PDF, 115 KB
english, 2003
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