Interpretation of spectroscopic ellipsometry measurements of ultrathin dielectric layers on silicon: impact of accuracy of the silicon optical constants
D. Tonova, M. Depas, J. VanhellemontVolume:
288
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(96)08859-1
File:
PDF, 324 KB
english, 1996