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Nucleation and growth mechanisms of copper MOCVD film on Au/Si substrates
Jung-Yeul Kim, P.J Reucroft, Dong-Koo ParkVolume:
289
Year:
1996
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(96)08908-0
File:
PDF, 850 KB
english, 1996